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High Purity 99.999% Si Sputtering Targets Vacuum Magnetic

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March 11, 2021
Category Connection: Sputtering Targets
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Tags:
#molybdenum sputtering targets #tantalum sputtering targets #zirconium sputtering target
Brief: Discover the High Purity 99.999% Si Sputtering Targets with Vacuum Magnetic Control, perfect for precision applications. These targets are manufactured using the Czochralski method, ensuring superior quality and performance. Available in various sizes and bonding types, they meet the highest industry standards.
Related Product Features:
  • Manufactured using the Czochralski method for high-quality silicon sputtering targets.
  • Available in round, plate, tube/ring/rotating target sizes for versatile applications.
  • High density (>99%) and purity (99.999%) ensure optimal performance.
  • Typical products include Si/Al 90/10%, Si/Al 1/99%, and Si/Al 0.5/99.5%.
  • Grain size is less than 100um for fine and consistent results.
  • Multiple bonding options: Indium, Elastomer, and Silver Adhesive.
  • Standard packaging includes carton box, vacuum packing, and wooden case packing.
  • Fast delivery within 2-3 working days with various shipping options available.
FAQs:
  • What is the purity level of the Si sputtering targets?
    The Si sputtering targets have a high purity level of 99.999%, ensuring top-quality performance for precision applications.
  • What sizes are available for the Si sputtering targets?
    The targets are available in round (Dia <360mm*T>1mm), plate (L<300mm*W<300mm*T>1mm), and tube/ring/rotating target (Dia<360mm*T>2mm) sizes.
  • What are the shipping options for the Si sputtering targets?
    We offer door-to-door shipping via DHL/TNT/UPS/FEDEX/EMS, as well as by air and by sea, with delivery within 2-3 working days.
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