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High Purity Molybdenum Sputtering Target For Vacuum Coating

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March 04, 2021
Category Connection: Sputtering Targets
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Tags:
#molybdenum sputtering targets #tantalum sputtering targets #zirconium sputtering target
Brief: Discover the High Purity 99.8% Titanium Sputtering Target for Vacuum Magnetic Control, designed to enhance film performance with superior purity and density. Ideal for vacuum coating applications, this titanium target ensures high-quality sputtered films with excellent electrical and optical properties.
Related Product Features:
  • High purity 99.8% titanium target for superior film performance.
  • Optimized density reduces pores and improves sputtering rate.
  • Available in round or square shapes for versatile applications.
  • Customizable sizes: Plate Target (200-400mm length, 100-20mm width, 15-30mm thickness).
  • Meets stringent chemical composition standards (Gr1, Gr2, Gr3, Gr4).
  • High tensile and yield strength for durability during sputtering.
  • Suitable for vacuum magnetic control and PVD coating processes.
  • Also available in other target materials like tungsten, molybdenum, and tantalum.
FAQs:
  • What is the purity level of the titanium sputtering target?
    The titanium sputtering target boasts a high purity level of 99.8%, ensuring optimal film performance.
  • What shapes and sizes are available for the titanium target?
    The titanium target is available in round or square shapes, with customizable sizes including Plate Target (200-400mm length, 100-20mm width, 15-30mm thickness).
  • How does the density of the target affect sputtering?
    Higher density reduces pores in the target, improving sputtering rate and enhancing the electrical and optical properties of the films.
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