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Vacuum Coating Chromium Sputtering Target

High Purity Zirconium Sputtering Targets Zr702 Diameter 140mm/D60mm /57mm

7.19g/cm3 Corrosion Resistant Chromium Sputtering Target

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Metallic Corrosion Resistant Chromium Target

Metallic Corrosion Resistant Chromium Target

High Purity Bright Surface Tantalum Sputtering Targets

High Purity 99.99% ITO Targets In2O3:SnO2 90:10 Wt%

Polished / Grinding Surface Niv7 Nickel Vanadium Sputtering Targets

High Purity 99.99% Min Magnesium Sputtering Target Ground

Sputtering Targets

(17)

Metallic Corrosion Resistant Chromium Target
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High Purity Silver Good Corrosion Resistance Chromium Target,Silver Sputtering Target Chromium (Cr) General Information: Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, ... Read More

2022-08-17 15:47:32

High Purity Bright Surface Tantalum Sputtering Targets
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99.99% High Purity Diameter 25-400 Tantalum Sputtering Target 1. Product name Tantalum Target 2. Purity 99.9~99.99% 3. Standard ASTM B708 4. Thickness 0.8mm - 30mm 5. Application Used for numerous heating ... Read More

2022-08-05 14:47:50

High Purity 99.99% ITO Targets In2O3:SnO2 90:10 Wt%
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High Purity 99.99% ITO Targets In2O3:SnO2=90:10 wt% Application In terms of application, ITO transparent conductive film glass is mainly used in LCD field, industrial field, transportation and other fields. In ... Read More

2022-08-03 16:35:16

Polished / Grinding Surface Niv7 Nickel Vanadium Sputtering Targets
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Customized polished or grinding surface High purity 99.95 NiV7 nickel vanadium sputtering target Instruction of Nickel Vanadium Sputtering Target: Nickel Vanadium (NiV7wt%) sputtering target Available purity: ... Read More

2022-07-25 15:23:56

High Purity 99.99% Min Magnesium Sputtering Target Ground
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99.99% Min Magnesium Sputtering Targets Ground Material: Magnesium/Mg Available purity: 99.9%, 99.95%, 99.99% Size: customized Application: PVD coating Product Name Purity Density Surface Processing Mg Target ... Read More

2022-07-14 14:41:03

Chrome Aluminium Alloy AlCr Sputtering Targets For Vacuum Magnetic Control PVD Coating
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Aluminium-Chromiun Alloy AlCr Sputtering Targets for Vacuum Magnetic Control PVD Coating Aluminum-Chromium (AlCr) targets react with nitrogen during reactive deposition to form superhard nitride coatings... Read More

2022-06-17 18:32:07

Zirconium Zr702 High Purity Metal Sputtering Targets
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Zirconium Zr702 High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent ... Read More

2022-04-15 16:06:53

99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface
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99.95%-99.99% High Purity Bright Surface Tantalum Sputtering Targets 1. Product name Tantalum Target 2. Purity 99.95~99.99% 3. Standard ASTM B708 4. Thickness 0.8mm - 30mm 5. Application Used for numerous ... Read More

2022-04-07 11:18:39

99.99% Aluminum Vacuum Magnetron Sputtering Targets For PVD Coating
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99.99% Aluminum Vacuum Magnetron Sputtering Used for PVD Coating Introduction: Product material 99.99% Al Specifications Round, rectangular. special-shaped Process vacuum magnetic levitation melting-casting ... Read More

2022-01-05 14:14:04

6.51g/cm3 Metal Coating Materials Zirconium 99.9% Sputtering Targets
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Sputtering Target Metal Sputtering Targets 99.9% High Purity Coating Materials Zirconium Sputtering Targets sputtering targets: Thickness: 0.04 to 1.40" (1.0 to 35mm). Width up to 20"(50 to 500mm). Length: 3.9" ... Read More

2021-12-29 11:40:19

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