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Sputtering Targets

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China High Purity 99.99% Min Magnesium Sputtering Target Ground factory

High Purity 99.99% Min Magnesium Sputtering Target Ground

99.99% Min Magnesium Sputtering Targets Ground Material: Magnesium/Mg Available purity: 99.9%, 99.95%, 99.99% Size: customized Application: PVD coating Product Name Purity Density Surface Processing Mg Target ... Read More
2021-04-02 13:45:17
China 99.99% Aluminum Vacuum Magnetron Sputtering Targets For PVD Coating factory

99.99% Aluminum Vacuum Magnetron Sputtering Targets For PVD Coating

99.99% Aluminum Vacuum Magnetron Sputtering Used for PVD Coating Introduction: Product material 99.99% Al Specifications Round, rectangular. special-shaped Process vacuum magnetic levitation melting-casting ... Read More
2021-04-02 13:43:33
China High Purity 99.999% Si Sputtering Targets Vacuum Magnetic Control factory

High Purity 99.999% Si Sputtering Targets Vacuum Magnetic Control

High Purity 99.999% Si Vacuum Magnetic control Sputtering Targets Specification Product name Silicon sputtering target Symbol Si sputtering target Manfucture method Czochralski method Size Round: Dia 1mm Plate: ... Read More
2021-03-24 18:46:02
China High Purity Bright Surface Tantalum Sputtering Targets factory

High Purity Bright Surface Tantalum Sputtering Targets

99.99% High Purity Diameter 25-400 Tantalum Sputtering Target 1. Product name Tantalum Target 2. Purity 99.9~99.99% 3. Standard ASTM B708 4. Thickness 0.8mm - 30mm 5. Application Used for numerous heating ... Read More
2021-03-17 17:05:38
China PVD Coating 99.5% Purity Zirconium Sputtering Targets factory

PVD Coating 99.5% Purity Zirconium Sputtering Targets

99.5% High Purity Zirconium Sputtering Target For Pvd Coating Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf Read More
2021-03-17 16:56:20
China High Purity 99.8% Titanium Sputtering Target Vacuum Magnetic Control factory

High Purity 99.8% Titanium Sputtering Target Vacuum Magnetic Control

High Purity 99.8% Vacuum Magnetic Control Titanium Sputtering Target Purity is one of the main performance indicators of the titanium target, because the purity of the target has a great influence on the ... Read More
2021-03-05 11:47:31
China ASTM B162 Nickel Sputtering Targets factory

ASTM B162 Nickel Sputtering Targets

Best Selling Nickel Sputtering Target Supplying Product name Nickel Sputtering Target Purity 99.6~99.9% Standard ASTM B162 Thickness 0.2mm - 30mm Application Used for numerous heating element application Strict ... Read More
2021-03-04 16:08:30
China PVD Coating High Purity 99.95% Chromium Sputtering Target factory

PVD Coating High Purity 99.95% Chromium Sputtering Target

PVD Coating High Purity 99.95% Chrome Sputtering Targets Round Target Quick Details of Chrome Sputtering Targets: Model Number: Cr1, Cr2 Application: combustion equipment, Aero-Space, Jewellery imensions: Dia: ... Read More
2021-01-19 14:32:56
China Metal Coating Materials Zirconium 99.9% Sputtering Targets factory

Metal Coating Materials Zirconium 99.9% Sputtering Targets

Sputtering Target Metal Sputtering Targets 99.9% High Purity Coating Materials Zirconium Sputtering Targets sputtering targets: Thickness: 0.04 to 1.40" (1.0 to 35mm). Width up to 20"(50 to 500mm). Length: 3.9" ... Read More
2021-01-19 14:15:49
China Polished / Grinding Surface Niv7 Nickel Vanadium Sputtering Targets factory

Polished / Grinding Surface Niv7 Nickel Vanadium Sputtering Targets

Customized polished or grinding surface High purity 99.95 NiV7 nickel vanadium sputtering target Instruction of Nickel Vanadium Sputtering Target: Nickel Vanadium (NiV7wt%) sputtering target Available purity: ... Read More
2021-01-18 18:46:44
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