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Zhengzhou Sanhui Refractory Metal Co., Ltd.
Home ProductsSputtering Targets

99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface

China Zhengzhou Sanhui Refractory Metal Co., Ltd. certification
China Zhengzhou Sanhui Refractory Metal Co., Ltd. certification
Zhengzhou Sanhui is professional partner with excellent quality and warm service.

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99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface

99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface
99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface

Large Image :  99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface

Product Details:
Place of Origin: China
Brand Name: SANHUI
Certification: RO5200
Model Number: Customized
Payment & Shipping Terms:
Minimum Order Quantity: 0.5 Kilograms
Packaging Details: Exported Plywood Case with Foam Inside
Delivery Time: 10 days after order
Payment Terms: T/T, L/C, Western Union
Supply Ability: 5000 Kilograms per month
Detailed Product Description
Density: 16.5 G/cm3 Surface: Bright
Conditions: Pure Ta Thickness: 3mm - 28mm
Width: 10mm-1000mm Length: 200-2000mm
Surface Finish: Ra0.8-1.6 Flatness: 0.1mm
High Light:

99.99% Tantalum Sputtering Targets

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99.95% Tantalum Sputtering Targets

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Bright Tantalum Sputtering Targets

99.95%-99.99% High Purity Bright Surface Tantalum Sputtering Targets

 

1. Product name Tantalum Target

 

2. Purity 99.95~99.99%

 

3. Standard ASTM B708

 

4. Thickness 0.8mm - 30mm

 

5. Application Used for numerous heating element

 

6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company.

 

7. Certification Report: Material Certification,CE,SGS, or testing report will be offered.

 

8. Chemical Compositions of tantalum target

 

Chemistry ppm
Designation Chief component Impurities maxmium
Ta Nb Fe Si Ni W Mo Ti O C H N
Ta1 Remainder 300 40 30 20 40 40 20 150 40 15 20
Ta2 Remainder 800 100 100 50 200 200 50 200 100 15 100
TaNb3 Remainder <35000 100 100 50 200 200 50 200 100 15 100
TaNb20 Remainder

170000-

230000

100 100 50 200 200 50 200 100 15 100
Ta2.5W Remainder 400 50 30 20 30000 60 20 150 50 15 60
Ta10W Remainder 400 50 30 20 110000 60 20 150 50 15 60

 

 

9. Specification

 

  Thickness (mm) Width (mm) Length (mm)
Foil 0.05~0.1 30~150 >=200
Sheet 0.1~0.5 30~500 >=200
Target 0.5~15 50~1000 >=200

 

99.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 099.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 199.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 299.95%-99.99% RO5200 Tantalum Sputtering Targets High Purity Bright Surface 3

 

 

 

Contact Details
Zhengzhou Sanhui Refractory Metal Co., Ltd.

Contact Person: Nikki Liu

Tel: 86-13783553056

Fax: 86-371-66364729

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