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Zhengzhou Sanhui Refractory Metal Co., Ltd.
Home ProductsMolybdenum Sputtering Target

10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor

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10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor

10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor
10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor
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Large Image :  10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor

Product Details:
Place of Origin: Henan, China
Brand Name: Sanhui
Certification: ISO 9001:2008
Model Number: Mo1
Payment & Shipping Terms:
Minimum Order Quantity: 10 pcs
Price: USD 50-80 per pc
Packaging Details: plywood case
Delivery Time: 15-20 days
Payment Terms: D/A, D/P, T/T, Western Union
Supply Ability: 5000 Pieces per Month
Detailed Product Description
Shape: Round, Square Grade: Pure Molybdenum Or Mo Alloy
Surface Treatment: Polished /ground Services: Deep Processing
Application: Vacuum Coating, Ion Sputtering Tolerance: +-0.1mm Thickness
Conditions: Vacuum Annealed Or Un-annealed Delivery Time: 10-25 Working Days
High Light:

10.22g/cm3 Molybdenum Sputtering Target

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Photoelectron Molybdenum Sputtering Target

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Semiconductor moly sputtering target

Molybdenum Sputtering Targets For Photoelectron and Semiconductor

 

Introduction of Molybdenum Sputtering Target

Product Name Purity Density Surface Processing
Mo target 99.95% 10.22g/cm3 Ground Rolling

 

There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target.

Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other industries. It is suitable for all planar coating and rotary coating systems.

 

Characteristics and specifications of molybdenum target:

Molybdenum sputtering target has excellent characteristics of molybdenum, such as high melting point, high electrical conductivity, shiny surface, better corrosion resistance and outstanding environmental protection.

Purity (%) Density (g/cm3) Specifications (mm)
>=99.95 >=9.9

Round target size: (60-100) Dia *(42-55) Width

Sheet target size: (8-16) Thickness * (80-200) Width * Length

Tube target size: (70-90.5) OD * (7-20) Thickness * Length

 

 

Applications of Molybdenum sputtering target:

Molybdenum sputtering target can be applied in vacuum coating industry, ion sputtering, flat panel display industry and photovoltaic industry. Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor.

 

Molybdenum, with high melting point, high conductivity, good corrosion resistance and other characteristics, and its specific impedance and membrane stress is only half of chromium. In addition, molybdenum is an environmentally friendly material, so there is no need to worry about environmental pollution. Therefore, molybdenum has become one of the preferred sputtering targets for flat panel displays. It is very important that, according to experts, molybdenum can also greatly improve the brightness, contrast, color and other performance of LCD and extend its service life.

 

For TFT-LCD molybdenum target, we can offer vacuum welding for large-size molybdenum target with copper base plate. 

 

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Contact Details
Zhengzhou Sanhui Refractory Metal Co., Ltd.

Contact Person: Lisa Ma

Tel: 86-15036139126

Fax: 86-371-66364729

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