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Molybdenum Sputtering Target

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China High Purity Molybdenum Tube Target For Thin Film Solar Cells New Energy factory

High Purity Molybdenum Tube Target For Thin Film Solar Cells New Energy

High Purity Molybdenum Tube Target used for thin film solar cells new energy Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry ... Read More
2022-01-10 18:29:30
China 99.97% High Purity Molybdenum Sputtering Target For PVD Coating Planar Mo Target factory

99.97% High Purity Molybdenum Sputtering Target For PVD Coating Planar Mo Target

99.97% High Purity Molybdenum Sputtering Targets for PVD Coating Mo Planar Target Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass ... Read More
2021-12-31 11:51:46
China High Purity Molybdenum Tube Rotatable Molybdenum Target For Glass Industry factory

High Purity Molybdenum Tube Rotatable Molybdenum Target For Glass Industry

High Purity Molybdenum Tube Molybdenum Rotatable Target for Glass Industry Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry ... Read More
2021-12-31 11:49:15
China High Purity Molybdenum Tube Sputtering Targets Rotating Targets With 3000mm Length factory

High Purity Molybdenum Tube Sputtering Targets Rotating Targets With 3000mm Length

99.95% Pure Molybdenum Sputtering Targets For PVD Coating Introduction of Molybdenum Sputtering Target There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. ... Read More
2021-12-29 09:56:01
China 99.97% Molybdenum Sputtering Target for Physical Vapor Deposition Coating factory

99.97% Molybdenum Sputtering Target for Physical Vapor Deposition Coating

High Purity 99.97% Molybdenum Sputtering Target for Physical Vapor Deposition Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 ... Read More
2021-12-28 17:25:01
China 3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating factory

3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating

3N5 99.95% Molybdenum Plate Sputtering Target For Vacuum Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling There are ... Read More
2021-11-24 11:58:52
China 10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating factory

10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating

10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum ... Read More
2021-06-10 11:40:10
China 10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor factory

10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor

Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling There are ... Read More
2021-04-08 11:45:56
China 10.2g/Cm3 Molybdenum Target For Photoelectron And Semiconductor factory

10.2g/Cm3 Molybdenum Target For Photoelectron And Semiconductor

Molybdenum Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are ... Read More
2021-04-02 13:53:39
China High Purity 99.97% Molybdenum Sputtering Target For Vacuum Coating factory

High Purity 99.97% Molybdenum Sputtering Target For Vacuum Coating

High Purity 99.97% Molybdenum Sputtering Target for Vacuum Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.97% 10.2g/cm3 Ground Rolling There are ... Read More
2021-04-02 13:51:24
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