|Rm.2009,20th Floor,Unit C,Yuhong Plaza,No. 61 Zijingshan Road，Zhengzhou,Chinafirstname.lastname@example.org|
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|Application:||Vacuum Magnetic Control Sputtering||Packing:||Vacuum Packaging|
99.8% Titanium Sputtering Target,
Magnetic Control Titanium Sputtering Target,
Gr1 titanium sputtering targets
High Purity 99.8% Vacuum Magnetic Control Titanium Sputtering Target
Purity is one of the main performance indicators of the titanium target, because the purity of the target has a great influence on the performance of the film.
Our titanium target has high purity of 99.8%.
In order to reduce the pores in the target and improve the properties of sputtered films, the target with high density is usually required. The density of the target not only affects the sputtering rate, but also affects the electrical and optical properties of the films. The higher the density of the target, the better the performance of the film. In addition, by increasing the density and strength of the target, the target can better withstand the thermal stress in the sputtering process. Density is also one of the key performance indicators of target materials.
We can also supply tungsten target, molybdenum target, tantalum target, niobium target, titanium target, nickel target.
Contact Person: Lisa Ma