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99.95% Purity Molybdenum Sputtering Target In Semiconductor

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99.95% Purity Molybdenum Sputtering Target In Semiconductor


Large Image :  99.95% Purity Molybdenum Sputtering Target In Semiconductor

Product Details:
Place of Origin: Henan, China
Brand Name: Sanhui
Certification: ISO 9001:2008
Model Number: Mo1
Payment & Shipping Terms:
Minimum Order Quantity: 10 pcs
Price: USD 50-80 per pc
Packaging Details: plywood case
Delivery Time: 15-20 days
Payment Terms: D/A, D/P, T/T, Western Union
Supply Ability: 5000 Pieces per Month
Detailed Product Description
Shape: Round, Square Grade: Pure Molybdenum Or Mo Alloy
Surface Treatment: Polished /ground Services: Deep Processing
Application: Vacuum Coating, Ion Sputtering Tolerance: +-0.1mm Thickness
Conditions: Vacuum Annealed Or Un-annealed Delivery Time: 10-25 Working Days
High Light:

99.95% Molybdenum Sputtering Target


Semiconductor Molybdenum Sputtering Target


99.95% molybdenum target

99.95% Purity Molybdenum Sputtering Target in Semiconductor


Introduction of Molybdenum Sputtering Target

Product Name Purity Density Surface Processing
Mo target 99.95% 10.22g/cm3 Ground Rolling


As a widely used refractory metal, molybdenum has excellent mechanical properties, low expansion, high thermal conductivity and high conductivity at high temperature. As sputtering target, there are many combinations, such as pure molybdenum target, molybdenum titanium target, molybdenum tantalum target and molybdenum alloy target (such as TZM plate). The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering.


There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target.

Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other industries. It is suitable for all planar coating and rotary coating systems.


Applications of Molybdenum sputtering target:

Molybdenum sputtering target can be applied in vacuum coating industry, ion sputtering, flat panel display industry and photovoltaic industry. Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor.


Therefore, molybdenum has become one of the preferred sputtering targets for flat panel displays. It is very important that, according to experts, molybdenum can also greatly improve the brightness, contrast, color and other performance of LCD and extend its service life.


For TFT-LCD molybdenum target, we can offer vacuum welding for large-size molybdenum target with copper base plate. 


Characteristics and specifications of molybdenum target:

Molybdenum sputtering target has excellent characteristics of molybdenum, such as high melting point, high electrical conductivity, shiny surface, better corrosion resistance and outstanding environmental protection.

Purity (%)

Density (g/cm3)

Specifications (mm)



Round target size: (60-100) Dia *(42-55) Width 

Sheet target size: (8-16) Thickness * (80-200) Width * Length

Tube target size: (70-90.5) OD *  (7-20) Thickness * Length


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Zhengzhou Sanhui Refractory Metal Co., Ltd.

Contact Person: Lisa Ma

Tel: 86-15036139126

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